Ceramic Sputtering Targets

Sci engineered materials provides ceramic and metal sputtering targets for use in sputtering and laser ablation including cathodic arc sources e beam and pulsed laser deposition pdl.

Ceramic sputtering targets.

We manufacture sputtering targets in a wide range of materials sizes forms and configurations. Sputtering targets our high purity low spit targets can resolve your concerns for uniformity reproducibility and homogeneity. The powder metallurgical process referred to as sintering. It was first established in 1994 to begin supplying high quality rare earth products to assist our customers in the research and development r d fields.

That time has now come. At that time we promised to address the analogous process of how ceramic or complex composite material sputtering targets are prepared. What was described was how sintering is an. Stanford advanced materials sam corporation is a global supplier of various sputtering targets such as metals alloys oxides ceramic materials.

A while back january 2016 we discussed a brief but fundamental description of what the basic processes are associated with the production of elemental and metal alloy sputtering targets. Advanced ceramics emerged during the twentieth century but is soaring with the help of modern science and technology. New species comes into being explosively in recent two to three decades. Our in house capabilities employ manufacturing methods that produce sputtering targets in the geometry that best fits your needs.

We supply bonded planar ceramic sprayed rotatable indium bonded metal or ceramic rotatable and monolithic metal target evaporation solutions. We further described the consolidation steps associated with this manufacturing process referred to as simple hot pressing. Sputtering targets the technical ceramics business of morgan advanced materials are specialists in the manufacture of ceramic sputtering targets for the semiconductor industry manufactured from 94 99 99 alumina and chemical vapor deposition cvd silicon carbide sic for physical vapour deposition pvd applications. Stanford advanced materials sam corporation is a global supplier of various sputtering targets such as metals alloys oxides ceramic materials.

Oxide ceramic sputtering targets. Using our in house forming and machining capability we manufacture one piece targets up to 20 diameter or 14 square tile arrays up to 3 meters and rotary targets up to 4 meters.